Un método simple de solución para preparar precursores de VO2:Co2+ para la deposición de película delgada mediante el método de procesamiento en solución
Un método simple de solución para preparar películas delgadas de VO2:Co2+
DOI:
https://doi.org/10.18633/biotecnia.v25i2.1886Palabras clave:
oxido de vanadio dopado con cobalto, películas delgadas mediante recubrimiento centrifugo, morfología porosa, procesamiento de la solución sin complejantes.Resumen
El procesamiento de soluciones es un método de bajo costo para preparar una variedad de películas delgadas orgánicas o inorgánicas. Para compuestos de óxidos metálicos, un procesamiento de solución de un compuesto organometálico se usa con frecuencia como solución precursora para ser recubierta por rotación, seguida de un tratamiento térmico para formar el óxido metálico. En este trabajo se obtienen polvos de óxido de vanadio a partir de una simple reacción ácido-base, y luego se dispersan en alcohol isopropílico para formar una solución para spin-coating. También se agregan diferentes cantidades de sal de cobalto junto con VOx en alcohol isopropílico para formar soluciones de VOx:Co2+. Después del tratamiento térmico a 200 °C, se obtienen películas delgadas transparentes. Se analizan las propiedades ópticas, estructurales, morfológicas y químicas. Se encontró que el compuesto VO2:Co2+ es amorfo y se obtiene con una relación atómica V:Co variada de 6.6:1-1.6:1. El material presenta una absorción óptica alrededor de 2.3 eV. Se observa una interesante morfología porosa interconectada cuando la relación atómica de V:Co es ~4.9:1. Se concluye que se pueden obtener películas delgadas amorfas porosas de VO2:Co2+ a partir del spin-coating a una baja temperatura de tratamiento utilizando una solución simple sin agente complejante.
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