A simple solution method to prepare VO2:Co2+ precursors for thin film deposition by solution-processing method: A simple solution method to prepare VO2:Co2+

F Hernandez-Guzman; Guillermo Suarez Campos; D Cabrera-German; MA Milan-Franco; H Hu; MA Quevedo-Lopez; M Sotelo-Lerma

doi:10.18633/biotecnia.v25i2.1886

Authors

F Hernandez-Guzman Departamento de Investigación en Polímeros y Materiales, Universidad de Sonora
G Suarez Campos Departamento de Química y Metalurgia, Universidad de Sonora, Hermosillo, Sonora https://orcid.org/0000-0002-9193-1710
D Cabrera-German Departamento de Investigación en Polímeros y Materiales, Universidad de Sonora https://orcid.org/0000-0001-8523-4671
MA Milan-Franco Instituto de Energías Renovables, Universidad Nacional Autónoma de México https://orcid.org/0000-0001-6104-3221
H Hu Instituto de Energías Renovables, Universidad Nacional Autónoma de México https://orcid.org/0000-0002-8256-7750
MA Quevedo-Lopez Departamento de Investigación en Polímeros y Materiales, Universidad de Sonora. Materials Science and Engineering Department, University of Texas at Dallas, Richardson, TX 75080, United States.
M Sotelo-Lerma Department of Research in Polymers and Materials, University of Sonora https://orcid.org/0000-0001-9995-8531

DOI:

https://doi.org/10.18633/biotecnia.v25i2.1886

Keywords:

cobalt doped vanadium oxide, spin-coated thin films, porous morphology, solution processing without ligands.

Abstract

Solution-processing is a low-cost solution method to preparea variety of organic or inorganic thin films. For metal oxide compounds, a solution-processing solution of an organometallic compound is frequently used as a precursor to be spin coated, followed by a thermal annealing to form metal oxide. In this work, vanadium oxide powders are obtained from a simple acid-base reaction, and then they are dispersed in isopropyl alcohol to form a solution for spin-coating. Different amount of cobalt salt are also added together with VOx into isopropyl alcohol to form VOx:Co2+ solutions. After thermal annealing at 200 °C, continuous transparent thin films are obtained. Optical, structural, morphological and chemical binding energies of those films are analyzed. It is found that amorphous VO2:Co2+ compound is formed in those films with V:Co atomic ratios between 6.6:1 and 1.6:1. Optical absorption onsets of those films are around 2.3 eV. An interesting interconnected porous morphology is observed when the atomic ratio of V:Co is around 4.9:1. It is concluded that porous amorphous cobalt doped vanadium oxide thin films can be obtained from a spin-coating process at low annealing temperature from a simple solution without any complex agent.

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A simple solution method to prepare VO2:Co2+ precursors for thin film deposition by solution-processing method